Streamline your patent due diligence with deep analytics for patents, inventors, and attorneys



Compare patents by technology sector



Deep Analytics



Quickly evaluate patents of interest

► Want to see more? Join for free!

PatentQuant Patent Profile
Generated February 18, 2018

Extraneous substance inspection method and apparatus

Patent Number: 5,644,393

Patent Information

Abstract
In the present invention, an extraneous substance inspection optical system having an extraneous inspection area of a predetermined scanning width in subscanning direction of a matter to be inspected is positioned in such a manner that the extraneous substance inspection area at a moment when the matter to be inspected is started to move in main scanning direction is arranged at a position in the main scanning direction corresponding to a head portion of the matter to be inspected; the matter to be inspected is moved in the main scanning direction to be subjected to a forward scanning for the matter to be inspected to thereby detect possible extraneous substances in the extraneous inspection area; and the matter to be inspected is rotated by 180.degree. after completing the forward scanning, then the matter to be inspected is moved in the direction opposite to the forward scanning to be subjected to a backward scanning, to thereby detect possible extraneous substances in the extraneous substance inspection area.
Patent Number: 5,644,393
Issue Date: 1997-07-01

Primary Category

Executive Summary

Summary

This patent was granted in ► Log In, which is ► Log In speed.

It has ► Log In claims, which is ► Log In than average for this category.

Its proximity to basic research is ► Log In than others in this category, and it displays ► Log In technology cycle time.

This patent received ► Log In citations from other patents, and references ► Log In other patents, as compared to other patents in this category.

Grant Time

► Log In

Claims

► Log In

► Want to see more? Join for free!

PatentStat Scores in Not categorized
These scores show the percentile ranks for each metric.
For example, a score of 90 means that 90% of similar patents had lower scores.

Patent Grant Time

This patent had ► Log In grant time compared to others in this category.

Patent grant time can be influenced by many factors. Activities within the USPTO that are beyond the control of patent attornies can influence grant time, but short grant times can also indicate well-written patents and dedicated efforts to respond rapidly to USPTO office actions with strong arguments. Shorter grant times are preferable, and the scores for this section are inverse measures — higher scores are better.

Patent Claims

This patent has ► Log In claims compared to others in this category.

The number of claims in a patent is correlated with its strength. Because greater claim counts increase the cost of a patent, more claims can indicate the importance an applicant assigns to a patent. Importantly, some may elect to file claims across multiple patents. A higher score in this metric indicates more claims, relative to others in this category.

Citations From Other Patents

This patent has received ► Log In citations from other patents, than others in this category.

Citations from other patents are an important measure of the significance of a patent. More citations indicate that other technologies build on a patent. Higher scores in this metric are better, and indicate more citations from other patents.

Citations to Other Patents

This patent referenced ► Log In citations to other patents, than others in this category.

A lower number of citations to other patents can be a sign of diminished patent strength. More citations indicate dependence on more other technologies. Higher scores in this category are better, and indicate fewer citations to other patents.

Research and Innovation Indicators
These are percentile ranks — they indicate the percentage of peers with lower scores.

Proximity to Basic Research

► Log In

0%

Proximity to Basic Research

This patent has ► Log In proximity to basic research compared to others in this category.

Proximity to basic research is measured by comparing the number of citations to non-patent literature among a cohort of patents. Because most non-patent citations are primary research papers, a higher count indicates greater proximity to basic research.

► Want to see more? Join for free!

Citations

Patents that cite this patent

Patent Title
8,817,248 Simultaneous multi-spot inspection and imaging
7,969,465 Method and apparatus for substrate imaging
7,968,354 Methods for correlating backside and frontside defects detected on a specimen and classification of backside defects
7,869,023 System for detecting anomalies and/or features of a surface
7,679,735 Optical system for detecting anomalies and/or features of surfaces
7,492,451 Simultaneous multi-spot inspection and imaging
7,365,834 Optical system for detecting anomalies and/or features of surfaces
7,280,199 System for detecting anomalies and/or features of a surface
7,088,443 System for detecting anomalies and/or features of a surface
7,012,684 Method and apparatus to provide for automated process verification and hierarchical substrate examination
6,954,267 Device for measuring surface defects
6,813,032 Method and apparatus for enhanced embedded substrate inspection through process data collection and substrate imaging techniques
6,791,680 System and method for inspecting semiconductor wafers
6,721,045 Method and apparatus to provide embedded substrate process monitoring through consolidation of multiple process inspection techniques
6,707,545 Optical signal routing method and apparatus providing multiple inspection collection points on semiconductor manufacturing systems
6,707,544 Particle detection and embedded vision system to enhance substrate yield and throughput
6,697,517 Particle detection and embedded vision system to enhance substrate yield and throughput
6,693,708 Method and apparatus for substrate surface inspection using spectral profiling techniques
6,630,995 Method and apparatus for embedded substrate and system status monitoring
6,608,676 System for detecting anomalies and/or features of a surface
6,603,542 High sensitivity optical inspection system and method for detecting flaws on a diffractive surface
6,407,809 Optical inspection system and method
6,121,156 Contact monitor, method of forming same and method of analyzing contact-, via-and/or trench-forming processes in an integrated circuit
6,020,957 System and method for inspecting semiconductor wafers
5,818,576 Extraneous substance inspection apparatus for patterned wafer

► Want to see more? Join for free!

Information presented on this site is collected from the USPTO and other sources. Errors may have been introduced in the original assembly or analysis of the data.
No warranties are expressed or implied.The content of this site is not a substitute for skilled legal, financial, or other guidance.
Copyright thinkBiotech LLC. All rights reserved.
Privacy policy.
`abc